Explanation of relevant knowledge points about plasma cleaning machine

　　Plasma is a substance produced by gas molecules in special occasions such as vacuum and discharge. The device for plasma cleaning/etching produces plasma by setting two electrodes in a sealed container to form an electromagnetic field, and using a vacuum pump to achieve a certain degree of vacuum. As the gas becomes thinner and thinner, the molecular distance and the free movement distance of molecules or ions become longer and longer. Under the action of the magnetic field, collisions occur to form plasma, and glow occurs at the same time. Plasma moves in the electromagnetic field and bombards the surface of the object being processed, thereby achieving the effects of surface treatment, cleaning and etching.

Plasma cleaning machine can be used to remove contamination on transmission electron microscope samples and sample rods, prevent carbon deposition to reduce image resolution and cause misjudgment of sample micro-area analysis. The instrument can also be used to clean various electron microscope accessories such as apertures. It is particularly suitable for field emission transmission electron microscopes and field emission scanning electron microscopes. Using this low-energy high-frequency plasma to clean the sample surface will not change the sample element composition and surface structure characteristics.

　The cleaning machine has three component channels: H2, O2, and Ar. Therefore, the H2/02 component can be used to reduce the damage of sample sputtering and to clean porous carbon films without damage. This improves the imaging ability of the sample at low voltage and improves its accuracy during chemical trace analysis. Oil-free vacuum system: The pump body is composed of a multi-stage diaphragm pump and an ultra-quiet molecular pump. The vacuum degree can reach 10E-4Pa level. While ensuring the vacuum degree, the vacuuming and degassing process can be achieved within two minutes; the entire cleaning process can be completed within 4 minutes. It can also clean most standard transmission electron microscope sample rods, scanning electron microscope sample stages, and irregular samples. The sample chamber diameter is >8cm and the sample chamber height is >5cm.

Depending on its different uses, the plasma cleaning machine can choose cleaning equipment of various structures, and can realize the process flow by selecting different types of gases and adjusting the characteristic parameters of the device, but the basic structure of the plasma cleaning device is roughly the same. That’s all the relevant knowledge points about plasma cleaning machines. There is still a lot of common sense about this product waiting for you to discover and understand. If you want to know more, please pay attention to us first. The editor will share more information with you here from time to time.