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CIF focuses on material surface treatment technology, providing customers with professional instrument equipment and application process solutions for cleaning, debonding, etching, coating and other aspects!
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  • 2024-11 12
    The plasma ashing instrument can complete the ashing of samples in a short time.

    Plasma ashing instrument, also known as plasma ashing equipment or plasma ashing furnace, is a device that uses plasma technology to oxidize and decompose organic matter in samples at high temperatures, thereby converting them into inorganic ash. Its core principle is to generate high-energy plasma to heat the sample to an ultra-high temperature in a short time, thereby achieving rapid ashing of the sample.

  • 2024-01 15
    Different plasma strippers may be suitable for different types of materials

    The working principle of plasma degumming machine is based on plasma technology, which uses the chemical and physical effects of high-energy ions and electrons to remove glue or adhesive residues. This technology has the advantages of high efficiency, no pollution and no need to use chemical solvents, so it is widely used in electronic manufacturing, optical devices, aerospace and automotive industries.

  • 2023-12 22
    RIE reactive ion etcher is a commonly used micro-nano processing equipment

    RIE Reactive Ion Etching is a commonly used micro-nano processing equipment, mainly used to prepare microstructures and nano devices. It introduces reactive gas into the vacuum chamber, applies radio frequency power and DC electric field, and etches the material surface by ion bombardment and chemical reaction. The vacuum chamber can be used to create and maintain a high vacuum environment. The vacuum chamber is usually composed of a high vacuum chamber and a low vacuum chamber, and the gas is removed by a vacuum pump system.

  • 2023-11 10
    UV ozone cleaning machine is a new innovative technology

    In today's society that focuses on hygiene and cleanliness, UV-ozone cleaning machines are rapidly gaining widespread attention. This equipment combines the characteristics of ultraviolet rays and ozone to provide an environmentally friendly and efficient cleaning solution. The synergistic effect of ultraviolet rays and ozone is used to sterilize and clean the air and surfaces. Ultraviolet rays have strong ultraviolet rays that can destroy the DNA structure of bacteria and viruses, causing them to die and lose their ability to reproduce. Ozone has strong oxidizing properties and can quickly oxidize and decompose organic matter to achieve a cleaning effect. Combining ultraviolet rays and ozone, by generating ozone and releasing ultraviolet rays, all-round cleaning and sterilization of the air and surfaces of objects can be achieved.

  • 2023-10 30
    Sharing of operating experience of electron microscope plasma cleaning machine

    Electron microscope plasma cleaning machine is a device used to clean and remove organic pollutants from the surface of electron microscope (EM) samples. Plasma is generated in a vacuum environment and the plasma beam is focused on the sample surface. The ions in the plasma beam have high energy. When they come into contact with the sample surface, ion impact and chemical reaction will occur, thereby removing organic pollutants and impurities on the surface.

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