Sharing of operating experience of electron microscope plasma cleaning machine

　　Electron microscope plasma cleaning machine is a device used to clean and remove organic pollutants from the surface of electron microscope (EM) samples. Plasma is generated in a vacuum environment and the plasma beam is focused on the sample surface. The ions in the plasma beam have high energy. When they come into contact with the sample surface, ion collision and chemical reaction will occur, thereby removing organic pollutants and impurities on the surface.

During the cleaning process, the energy and focusing degree of the ion beam can be adjusted according to the different requirements of the sample to achieve the control of the cleaning effect of different materials and pollutants. Usually there are a variety of cleaning modes and parameter settings, which can adapt to the cleaning needs of different samples. Its application is mainly concentrated in the preparation process of electron microscope samples. Before electron microscope observation, the sample surface usually needs to remove organic pollutants, grease, dust, etc. to ensure the purity and clarity of the sample surface. It can effectively remove these pollutants and provide a clean sample surface for better electron microscope observation and analysis.

When using an electron microscope plasma cleaning machine, you can follow the following steps:

1. Prepare the electron microscope sample to be cleaned. Make sure there is no obvious dust, grease or organic pollutants on the sample surface.

2. Turn on the power and turn on the vacuum system according to the instructions on the equipment manual. Ensure that the equipment is in proper working condition.

3. Place the sample on the sample stage of the equipment. According to the size and shape of the sample, select a suitable fixture or bracket to ensure that the sample is firmly fixed on the sample stage.

4. Set appropriate cleaning parameters according to the characteristics of the sample and the cleaning requirements. These parameters include ion beam energy, beam current density, cleaning time, etc. Generally speaking, the higher the ion beam energy and beam current density, the stronger the cleaning effect, but also be careful not to damage the sample.

5. After confirming that the parameter settings are correct, start the cleaning program. The plasma beam will begin to clean the surface of the sample. During the cleaning process, the changes on the sample surface can be observed in real time to ensure that the cleaning effect meets the requirements.

6. After the cleaning time reaches the set value, stop the cleaning program. Turn off the ion source and vacuum system, and wait for the equipment to return to normal pressure.

7. Carefully remove the cleaned sample, taking care to avoid damage to the sample surface. You can use a microscope or other detection equipment to check the sample to ensure that the cleaning effect is satisfactory.

8. After cleaning, perform necessary maintenance and cleaning on the equipment. Clean the ion source, sample stage and other related parts to ensure the normal operation and long-term stability of the equipment.