The device that generates plasma in a plasma cleaning machine is to place two electrodes in a sealed container to form an electric field, and use a vacuum pump to achieve a certain degree of vacuum. As the gas becomes thinner, the molecular distance and the free movement distance of molecules or ions become longer and longer. Under the action of the positive and negative electric fields, they collide to form plasma. These ions have high enough activity and energy to break almost all chemical bonds and cause chemical reactions on any exposed surface. Plasmas of different gases have different chemical properties. For example, oxygen plasma has high oxidation properties and can oxidize photoresist to produce gas, thereby achieving a cleaning effect. The plasma of corrosive gases has good anisotropy and can meet the needs of etching.
Advantages of plasma cleaning machine:
1. The cleaning object is dry after plasma cleaning and can be sent to the next process without further drying treatment. It can improve the processing efficiency of the entire process line;
Second, it allows users to stay away from the harm of harmful solvents to the human body, and also avoids the problem of easy damage to the cleaning object in wet cleaning;
Third, avoid using harmful solvents such as trichloroethane, so that no harmful pollutants will be produced after cleaning, so this cleaning method is an environmentally friendly green cleaning method. This is increasingly important in the context of global attention to environmental protection;
Fourth, the plasma generated by high frequency in the radio wave range is different from direct light such as laser. The directionality of plasma is not strong, which allows it to penetrate into the tiny holes and recesses of the object to complete the cleaning task, so there is no need to consider the shape of the object to be cleaned too much. Moreover, the cleaning effect on these difficult-to-clean parts is similar to or even better than that of Freon cleaning;
Five, using plasma cleaning can improve the cleaning efficiency. The entire cleaning process can be completed within a few minutes, so it has the characteristics of high yield;
Sixth, the vacuum degree to be controlled is about 100Pa, and this cleaning condition is easy to achieve. Therefore, the equipment cost of this device is not high, and the cleaning process does not require the use of expensive organic solvents, which makes the overall cost lower than the traditional wet cleaning process.
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