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CIF focuses on material surface treatment technology, providing customers with professional instrument equipment and application process solutions for cleaning, debonding, etching, coating and other aspects!
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Semiconductor

Time:2023-06-01      Click Count:131

Plasma cleaning equipment can be widely used in the semiconductor manufacturing process. Semiconductor manufacturing involves multiple steps, one of which is to clean the surface of semiconductor equipment, remove contaminants such as sediments, organic matter, dust, etc., to ensure the quality and performance of the equipment. Plasma cleaning equipment can use the active ions and chemical reactions generated by plasma to clean on a very small scale.

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