In the field of microelectronics manufacturing, plasma cleaning machines are widely used in multiple links. For example, in the wafer manufacturing process, plasma cleaning can effectively remove photoresist residues and metal impurities, improving the electrical performance and reliability of the chip; in the packaging and testing stage, plasma cleaning can remove oxides and contaminants on the surface of lead frames and packaging materials, improving the sealing and stability of the package. In addition, plasma cleaning technology also plays an important role in cutting-edge fields such as MEMS (micro-electromechanical systems) and nanotechnology.
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