CIF plasma vaporization grafting instrument

Category： Plasma Cleaners

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Surface Modification

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Photoresist Removal

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Etching

Plasma Etchers

Coating

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Product Parameters

CIF plasma vaporization grafting instrument (CPV-G) is a supporting equipment for plasma surface treatment instrument. It is mainly used to vaporize liquid raw materials and input them into the reaction chamber of plasma surface treatment instrument at a certain flow rate to carry out grafting and deposition on the material surface. It is suitable for various plasma treatment equipment.

Attribute: Product Name; Model; Manufacturer Nature; Visits; Time

Details: CIF plasma vaporization grafting instrument; CPV-G; Manufacturer; 67次; 2021-04-15

Products Details

Product Features

1、 Removable sample heating chamber and gas mixing chamber, easy to clean and replace different liquid samples.

2、The gas mixing chamber is made of polytetrafluoroethylene PTFE material, which is inert, acid and alkali resistant, and has good thermal insulation performance.

3、 The pipeline insulation heating system can ensure that the vaporized gas will not condense and keep the ventilation smooth.

4、 The sample heating chamber and pipeline are easy to clean, and various sample residues in the pipeline can be automatically cleaned.

5、Three-way gas design is more in line with process requirements. One gas enters the heating chamber, one gas enters the gas mixing chamber, and one grafted gas.

6、 Dual flow meter design, accurate control.