CIF Laboratory plasma cleaner (CPC-E, CPC-F/FM)

Category： Plasma Cleaners

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Surface Modification

Plasma Cleaners Ultraviolet Ozone Cleaners

Photoresist Removal

Plasma Strippers

Etching

Plasma Etchers

Coating

Gel Driers Spin Coaters Plasma Sputtering Coaters

Product Parameters

CIF launched a new generation of plasma cleaner. The reasonable structure design,optimized processing chamber and larger sample size broaden its application range. CIFplasma cleaners are well accepted by many scientific research customers because ofreliable performance, easy to operate and maintain.

Attribute: Product Name; Model; Manufacturer Nature; Visits; Time

Details: CIF Laboratory plasma cleaner (CPC-E, CPC-F/FM); CPC-F/Fplus; Manufacturer; 141次; 2024-04-09

Products Details

Working principle of plasma cleaning machine

Plasma, like solids, liquids, and gases, is a state of matter known as the fourth state. Matter typically exists in three states: solid, liquid, and gas. However, there are special cases where a fourth state exists, such as in the ionosphere of Earth's atmosphere. Substances that exist in the plasma state include electrons in high-speed motion; neutral atoms, molecules, and groups of atoms (free radicals) in an active state; ionized atoms ormolecules; unreacted molecules and atoms. Despite this variety of particles present within plasma, the substance remains generally electrically neutral.The plasma cleaning machine generates high-energy disordered plasma in the vacuum chamber through the RF power supply under a certain pressure. By bombarding the surface of the material to be cleaned, it changes and optimizes the surface properties of the material, achieving the purpose of surface cleaning and modification.
Applications

Plasma cleaners are widely used in materials science, microelectronics, semiconductors, circuit boards, LEDs, microfluidics, photoelectric solar energy and other fields for the purposes of material surface cleaning, activation, modification and etching.

Function & Features

1、The 7-inch color touch screen provides an interactive operation interface that automatically controls and monitors processing parameters and status. It supports up to 20 protocols, while process data can be stored and traced.

2、The entire cleaning process is controlled by a PLC, offering both manual and automatic operating modes.

3、The CIF plasma cleaners are equipped with Dwyer gas float flowmeter or mass flowmeter (CPC-FM), enabling precise gas control for inputting oxygen, argon, nitrogen, hydrogen, or mixed gases.

4、The utilization of gas backfill purge and HEPA efficient filtration effectively mitigates the risk of secondary pollution.

5、The vacuum chamber is available in 316 stainless steel and quartz. The entire vacuum pipe system is constructed from corrosion-resistant and pollution-free 316 stainless steel.

6、The operation panel features a 60-degree tilt design, providing ergonomic and userfriendly operation.

7、The upper controller and lower chamber are specially designed to be compact, saving valuable laboratory space.

8、 A concave front panel design effectively protects the flow meter and chamber door from potential damage.

9、This system ensures fast, efficient, and uniform processing with no pollution, excellent repeatability.

10、Low sample processing temperature without thermal damage or oxidation risks.

11、 It incorporates a safety protection mechanism that automatically cuts off power when the door is opened.

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