CIF UV Ozone Cleaner

CIF Ultraviolet Ozone Cleaner is a cost-effective, efficient, and rapid device designed for the effective removal of organic 

contaminants from various inorganic substrates such as quartz, silicon, gold, nickel, aluminum, gallium arsenide, alumina and more.

Equipped with long-life UV lamps, it delivers exceptional cleaning performance and is widely used in both research and industrial applications.

                       UVO4                                                                                                                               UVO8  

Working Principle

Utilizing dual-wavelength UV light at 185nm and 254nm, the system excites ozone to generate highly reactive oxygen species (O). These species efficiently oxidize contaminants into volatile byproducts such as CO₂ and H₂O, achieving non-contact, damage-free surface cleaning and modification.

Applications

Optical Components: Lenses, prisms, photomasks, LCD panels, and mirrors.

Semiconductors & Microelectronics: Silicon wafers, reticles, camera modules, and optoelectronic sensors.

Electronic Packaging: ITO glass, PCB/FPC, BGA substrates, and COF/COG interfaces.

Polymer Materials: Rubber/plastic bonding surfaces, biochips, medical catheters, and functional thin films.

Scientific Research: Nanomaterials, polymer modification, photochemistry, and bio-interface treatment.

Function & Features 

Intelligent Integrated Control: Features a 4.3-inch color touchscreen with a bilingual English/Chinese interface, enabling real-time monitoring and adjustment of process parameters.

Precise Timing & Temperature Control: Supports a maximum timer setting of 99 hours, 59 minutes, and 59 seconds, complete with an audible alert upon countdown completion.

Long-Lasting UV Lamps: Equipped with low-pressure mercury lamps boasting a lifespan of up to 8,000 hours.

Comprehensive Safety Protection: Designed with an auto power-off mechanism triggered by opening the lid, alongside a built-in safety lock.

Technical Specification