CIF Flash Evaporation Film-forming System

Function & Features

Intelligent integrated control system.

A 7-inch color touchscreen supports Chinese and English for real-time monitoring and adjustment of process  parameters. The system stores up to 20 processing recipes, ensuring full operational traceability.

Dual-mode flexible operation.

The equipment features an integrated PLC control system that enables smooth one-click switching between manual and automatic modes, supporting a wide range of applications from R&D to large-scale production.

High-quality film formation performance.

The vacuum environment accelerates solvent evaporation and encourages solute ordering, yielding dense, uniform, low-defect thin films of high quality.

Precise gas and environmental control.

An integrated mass flow controller (0–500 sccm) ensures precise gas delivery, with inert gas protection and HEPA filtration preventing contamination and meeting strict cleanroom requirements.

Wide compatibility and high scalability.

Compatible with various substrates such as silicon wafers, glass, and ITO, and functional layers like electron and hole transport layers, enhancing device performance and stability. An optional heating stage (RT–200°C) is available for broader applications.

Outstanding process uniformity.

Precise control of temperature, vacuum, and evaporation rate enables uniform large-area film deposition and resolves solubility compatibility issues in multilayer device fabrication.

Stable and reliable operation.

The system features a robust mechanical design that enables long-term continuous operation with consistent, repeatable performance.