Applications 

Spin coater can be widely used for surface coating of microelectronics, semiconductors, new  energy, chemical materials, biological materials, optics, silicons, slides, wafers, substrates,  ITO conductive glasses and other process plates. 

Semiconductor device preparation: preparing electrodes, media and sensitive layer materials  for semiconductor devices such as transistors, solar cells and photovoltaic devices.

Optoelectronic device manufacturing: The preparation of thin film materials for liquid  crystal displays, OLED displays, LED components, and other optoelectronic  components.

Biomedical sensor manufacturing: Sensitive materials for biomedical sensors, such as  proteins, DNA and cells.

Preparation of nanomaterials: The preparation process plays a crucial role in determining  the structure and morphology of nanoparticles, nanowires, and nano-films.

Function & Features 

 The CIF spin coater utilizes a closed-loop control servo motor with digital signal  feedback for speed adjustment, ensuring precise and uniform coating distribution. 

 The equipment is equipped with a 7-inch full-color touch screen and an intelligent  programmed controller. It comes with 10 preset coating protocols as standard, allowing  users to define the spin speed and time. Additionally, there are 20 optional coating  protocols available, each consisting of 10 steps for a total of 100 segments. 

 The incorporation of a built-in horizontal calibration device guarantees the consistency  of the coating.

 Multi-safety protection mechanism: 

 - Electromagnetic safety switch stops the chuck in case of cover is opened.  

- Self-locking function prevents the personal injury caused by flying substrates or  bounced off cover. 

 - Double security top cover with polytetrafluorochimeric tempered glass avoids hurts  caused by flying pices of glass or acrylic cover.  

 The triple seal safety protection mechanism between the sample tray and its bayonet  effectively minimizes the risk of solution entering the motor. 

 One machine, two purposes. Both vacuum chuck and non-vacuum chuck are available;  

 The sample tray is designed ergonomically for effortless operation. 

 The stainless steel housing, toughened glass cover, acid-alkali resistant PTFE chamber,  and polypropylene (NPP-H) chuck collectively ensure optimal operation in a variety of  harsh conditions. 

 The design features an upper and lower double chamber configuration - the upper  chamber facilitates easy removal of residual solution, while the lower chamber serves  as a collection point for waste solution.

 Optional features include nitrogen purging, nitrogen protection, automatic dispensing,  or a simple dispenser. 

 The materials suitable for processing include silicon wafers, glass, quartz, metals such  as GaAs and GaN, InP, and other similar substances.