中文

中文
English
400-6505-735

Products

CIF focuses on material surface treatment technology, providing customers with professional instrument equipment and application process solutions for cleaning, debonding, etching, coating and other aspects!
Home  -  Products  -  Surface Modification > Ultraviolet Ozone Cleaners > CIF UV ozone cleaning machine

CIF UV ozone cleaning machine

Product Parameters

The Ultraviolet Ozone Cleaner is a cost-effective, efficient, and rapid device designed for theeffective removal of organic contaminants from various inorganic substrates such as quartz,silicon, gold, nickel, aluminum, gallium arsenide, alumina and more. The UV ozone cleaners launched by CIF utilize a durable UV quartz low pressure mercury vapor grid lamp. To enhance cleaning efficacy, optional features such as height-adjustable sample stage and heating temperature control are available.
Attribute
Product Name
Model
Manufacturer Nature
Visits
Time
Details
CIF UV ozone cleaning machine
UVO系列
Manufacturer
81次
2024-06-12

Products Details

1710812501140.jpg

Working principle of Ultraviolet ozone cleaning machine:

High-energy ultraviolet rays with wavelengths of 185nm and 254nm are emitted by ultraviolet lamps in order to effectively eliminate organic molecules (pollutants). The light energy at a wavelength of 185nm can facilitate the decomposition of oxygen (O2) present in the air into ozone (O3), while the light energy at a wavelength of 254nm can promote the breakdown of O3 into O2 and atomic oxygen (O).

The 254nm ultraviolet light simultaneously excites organic molecules on the surface, enhancing their sensitivity, which can be compromised by ozone molecular clusters. In the continuous photosensitive oxidation reaction, the generated active atomic oxygen (O) reacts with activated organic matter (i.e., hydrocarbon) molecules to produce volatile gases (such as CO2, CO, H2O, NO, etc.) that escape from the material's surface. This process effectively eliminates carbon and organic pollutants adhering to the material's surface for efficient cleaning.

image.png

Applications

Quartz/glass surface cleaning: LCD panel, plasma television screen, color filter, light diffuser, prism, lens, mirror, flat-panel TV, etc.

image.png

Surface cleaning of microelectronic products: micro motor shaft, magnetic head drive frame, optical disc, photoelectric device, mobile phone camera, micro speaker/receiver shock film, semiconductor silicon wafer, mask plate.

image.png

Precision integrated circuit surface cleaning: incl. liquid crystal display, ITO, precision circuit board, soft circuit board connector, BGA substrates, COG, COF(ILB) joints, film substrates, metal substrates, BGA substrates and bonding pads.

image.png

Surface modification of polymer products before bonding or printing: rubber bonding, surface modification of plastic automotive parts, lens protective film, plastic film, resin-shaped air bag, IC packaging and injection needle joints, etc.

image.png

Surface cleaning and treatment in scientific research procedures: semiconductors, biochips, nanomaterials, polymers, photochemistry, etc.

image.png

Function & Features

1、 UVO series: Programmable digital controller equipped with a four-button operation panel and a user-friendly interface. UVO T and P series: 5" color touch screen, allowing adjustable heating time and temperature display.

2、The automatic compensation function adjusts the intensity and density of UV light to ensure that the cleaning effect remains unaffected by the attenuation caused by UV lamp aging.

3、 The digital countdown indicates the duration of the cleaning process. The time can beset from 1 to 999 minutes.

4、The processing can be manually interrupted at any given time.

5、 The system automatically stores the previous parameter configurations.

6、 A temperature-controlled sample stage is optional. The temperature range spans from room temperature to 220℃ , with an accuracy of 0.1℃.

7、The switch cover features an overhead and push-down hinged design, ensuring convenient operation.

8、The upper sample stage allows users to load samples in a 360-degree manner,facilitating easy operation.

9、 The height of sample stage is adjustable, allowing users to modify the distance between the UV lamp and samples as well as secure the position of the sample stage.

10、 The UV lamp is a low pressure mercury grating lamp with a service life of approximately 8000 hours.

11、The high-intensity UV lamp emits light at wavelengths of 185nm and 254nm.

12、The system logs the operating time of the UV lamp and will provide a prompt when replacement is needed.

13、 UV reflector is 25mm larger than UV lamp.

14、 The dual safety mechanism ensures that the UV lamp is automatically turned off and prompts the light status when the cleaning chamber is opened.

15、 The system features two separate gas paths, one for inlet and one for outlet.

16、The introduction of oxygen or ozone into the inlet can be considered to potentially enhance ozone production (optional).

17、An ozone neutralizer for ozone removal is optional. For UVO5, it is external; for UVO9&13, it can be either external or integrated.

18、Vacuum reaction chambers in aluminum or quartz materials can be customized

according to customer requirements.


Recommended Products
400-6505-735
  • CIF WeChat official account

  • CIF Tiktok

Copyright © CIF (Beijing) Tech Co., Ltd. Al Rights Reseved    ICP:

TEL:400-6505-735