Product Parameters
Products Details
Function & Features:
1、The 7-inch color touch screen provides an interactive operation interface that automatically controls and monitors processing parameters and status. It supports up to 20 protocols, while process data can be stored and traced.
2、The entire cleaning process is controlled by a PLC, offering both manual and automatic operating modes.
3、 The vacuum chamber is available in stainless steel or quartz. The entire vacuum pipe system is constructed from corrosion-resistant and pollution-free 316 stainless steel.
4、The CIF plasma cleaners are equipped with mass flowmeter (CPC-FM), enabling precise gas control for inputting oxygen, argon, nitrogen, hydrogen, or mixed gases.
5、The utilization of gas backfill purge and HEPA efficient filtration effectively mitigates the risk of secondary pollution.
6、The operation panel features a 60-degree tilt design, providing ergonomic and userfriendly operation.
7、The vacuum chamber features an overhead top loading design with a press down hinge switch, ensuring convenient operation.
8、The plasma cleaning machine adopts a shower-type porous air intake to enhance the uniformity of single-hole air intake, thereby improving its traditional design.
9、The overhead 360° sample stage is designed with ergonomic features and facilitates easy loading of samples.
10、The spacious working area is capable of processing silicon wafers with a maximum diameter of 8 inches.
11、It incorporates a safety protection mechanism that automatically cuts off power when the door is opened.
12、The CPC-10 series have been specifically engineered to accommodate larger samples and fulfill the requirements of laboratory and pilot production simulation conditions.
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