CIF-MTS3 Multi-target Magnetron Sputtering Coating System

Core Features

1. Versatile Chamber Design: 

Adopts SUS304 stainless steel square chamber with a front-opening door structure, adaptable to various experimental working conditions.

2. Reliable Intelligent Vacuum System:

Equipped with a combined molecular pump and mechanical pump, matched with pneumatic vacuum valves and dual digital display compound vacuum gauges for low and high vacuum ranges. It supports dual-mode regulation of gas flow and chamber pressure, delivering flexible and intelligent process adjustment for diverse coating processes.

3. High-precision Gas Control:

Fitted with professional mass flow meters, compatible with oxygen, argon, nitrogen, hydrogen and various mixed gases. It boasts wide gas source adaptability and ultra-high flow control accuracy.

4. Multi-mode Sputtering Function:

Configured with three 3-inch DC/RF compatible magnetron target guns. It supports independent sputtering of a single target, sequential sputtering and co-sputtering of multiple targets, capable of depositing various films, including metals, alloys, semiconductors, ceramics and dielectrics.

5. Precise Substrate Temperature Control System:

The liftable substrate stage can be heated up to 600 °C (water cooling configuration is optional). The rotating speed is continuously adjustable from 0 to 60 r/min, ensuring uniform and dense films in all directions.

6. Intelligent Safety Control System: 

Powered by PLC and equipped with a 7-inch touch screen for fully automatic programmed operation. It is embedded with program interlock protection and fault alarm functions, ensuring stable operation and safe use.

Applications 

1. Scientific Research & Teaching: Used for teaching experiments and fundamental thin film research in universities and research institutes, as well as exploratory experiments and new product process development for enterprises. It provides a stable and reliable experimental platform for various thin film preparation.

2. New Energy & Optoelectronics: Fabricates electrodes and functional thin films for perovskite solar cells, OLEDs, organic photovoltaic (OPV) cells and flexible electronic devices, facilitating performance optimization and process upgrading of new energy devices.

3. Semiconductor & Microelectronics Industry: Deposits metallized films, passivation layers and barrier layers for semiconductor devices, MEMS, chip packaging and sensors, meeting the high-precision coating requirements of micro-nano fabrication.

4. Optics & Precision Manufacturing: Prepares optical thin films for optical lenses, optical filters and mirrors; deposits wear-resistant and anti-corrosion coatings on precision mechanical parts and molds to improve product performance and service life.

5. Advanced Material R&D: Develops functional ceramic films, nanocomposite films, catalytic films and biomedical films, supporting cutting-edge exploration and technological innovation in material science.