CIF Plasma Enhancer

Core Advantages

1. In-Situ Upgrade & Retrofit: This unit can be directly fitted to existing tube furnaces without full equipment replacement. It delivers a short retrofit cycle and low capital investment, enabling rapid functional enhancement of your original system.

2. Low-Temperature Deposition Technology: Plasma effectively activates precursor gases to substantially reduce reaction temperatures, making it highly compatible with temperature-sensitive substrates.

3. Outstanding Thin-Film Quality: The deposited films feature high density, excellent uniformity, and strong adhesion. This process minimizes film defects and boosts overall production yield.

4. Expanded Material Compatibility: It enables the deposition of various functional thin films that cannot be achieved by conventional thermal CVD processes,fulfilling rigorous process requirements across multiple industries. 

Function & Features

1. Intelligent interactive interface: Featuring a 7-inch color touchscreen, the system supports bilingual operation in Chinese and English. It enables real-time monitoring and automatic adjustment of process parameters. With 20 pre-programmed recipes, the system allows for efficient storage and traceability of process data,facilitating efficient management of production and experimental processes.

2. Reliable control system: It adopts PLC for full-process control and supports both manual and automatic operation modes to ensure a stable and reliable cleaning process.

3. High Compatibility: The vertically adjustable ICP ion source suits CVD tube furnaces of all brands and specifications, offering outstanding universal adaptability.

4. Humanized operation design: The operation panel is designed at a 60°angle, which conforms to ergonomics, with a friendly interface and convenient operation; the upper control and lower cabin structure is compact, saving space; the front panel is concave, protecting the flowmeter and cabin door from damage.

5. Highly efficient and stable process: The treatment process is fast, uniform, and repeatable, with no pollution; the sample processing temperature is low, avoiding thermal damage and thermal oxidation.

6. Customization available: We can provide tailored solutions including ion source specifications and control modes based on customers' furnace structure and process requirements.